Applications: Optical Device Fabrication

Solarzellenherstellung

Flachbildschirmherstellung

Dünnfilmbeschichtung

Dünnfilmmessung

Halbleitertechnik

Elektronik

Mems/Moems/Optik

Forschung und Entwicklung

ULVAC Technologies, Inc.

NLD Etch Process Equipment

Applications: Optical Device Fabrication

Deep Oxide Etch Process Services

Applications: Optical Device Fabrication

High Aspect Etch

CVD SiO2; 6.0un deep; Aspect Ratio: 9.0

Side Angle Control

SiO2 Arrayed Waveguide

InP Waveguide

Quartz Micro-Lens-Array

The NLD Etch System is extremely versatile, enabling etch processes for a variety of optical device materials. Available processes include mask, core and micro lens etching, thereby, reducing the number of systems required for device manufacturing.