SDP in-line sputter for metal bulk films

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SDP In-line Sputter for Metal Bulk Films

The SDP Series are in-line sputtering systems for deposition of ITO films and other metal films. They can be used to deposit films such as low-resistance ITO films, transparent conductive films, and multilayer chrome films for low-reflection black matrices.

Features

  • Use of inclined transfer method makes handling of large substrates easy.
  • High productivity, with standard carrier throughput of 60 seconds.
  • Use of vacuum return method enables smaller footprint.
  • For deposition of ITO films for color filters, return unit enables vacuum annealing, for high film quality.
  • Uses bottom-mounted independent rack-and-pinion transfer system, a highly reliable system with a well-established track record.
  • Enables simple maintenance.

Applications

  • Transparent conducting films for PDPs
  • Color filters

Specifications

 
SDP- s 1350
SDP- s 1550
Effective area (mm2)
1200 X1300
1500 X1800
Number of substrates
1 (1,250 x 1,110 mm)
2 (750 x 950 mm)
Standard tact time
50 sec/carrier
60 sec/carrier
Heated deposition method
Standard heated deposition/
non-heated deposition,
Inclining temperature deposition
+
vacuum annealing (option)
Standard heated deposition/
non-heated deposition,
Inclining temperature deposition
+
vacuum annealing (option)