Sputtering Targets for LCD

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In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. ULVAC provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.

Features

  • Development of Ultra-high density ITO target for transparent dielectric layer (density of 99.5% or greater is guaranteed)
  • Fine crystal particle, splash-free, large Al target
  • Large, monolithic Mo target
  • Development of high purity (4N or greater), large, monolithic Cr target

Applications

  • Transparent dielectric layer for TFT and color filter
  • Electrode for TFT
  • Wiring for TFT
  • Blackmatrix material
  • Barrier metal for TFT

Resistance stability of ultra-high density ITO target

Impurity for ITO Target

Impurity Element
Fe
Cu
Pb
Al
Ni
SnO2 structure rating
Allowable Level
£30 ppm
£20 ppm
£20 ppm
£10 ppm
£10 ppm
10±0.5wt%

 

For Electronic Parts
Ni
NiCr
Al
AlTi
TiB

Resistance films
Resistance films
Wiring
Reflection films
For Magnetic Heads/
Memory Media
Ta
NiMn
FeNi
PtMn
Al2O3
AlTi
CoCrPt
CoCrPtB
Si
C
GeAsTe
Bi
AgInAsTe

For Head




For MO
For HD Memory



DVD

CD-RW
Mask Materials

MoSix
Cr
TaB
TaGe
Phase Shift Mask

For X-ray Exposure
Reflection-increase
Anti-reflection Film Coating
on Glass/Resin

Si
SiO2
Ti (TiO2)
Al (Al2O3)
SUS
Ta
Ag
AR Coat
Cylindrical SHaped, Large, Monolithic Products, etc are available
Materials for Solar Batteries
ZnO
ITO
ZnO-Al2O3
Al
Si

Thin Film Materials for Solar Batteries