
Magest S200 is a PVD system for TMR multilayer films and magnetic shield. Multi-chamber configuration is equipped and supports applications ranging from R&D to mass-production.
| Loading/unloading chamber | 1 | Wafer stocker type |
| Transfer chamber | 1 | Double arm type |
| Pre-cleaning chamber | 1 | LT-ICP etching |
| Deposition chambers | 4 | Dedicated 3-source cathode, dedicated Al cathodes |
| Oxidation chamber | 1 | ISM radical oxidation |
| Deposition Film types | Ta, NiFe, Pt, PtMn, CoFe, Ru, Al, other | |