
Batch type High Vacuum Evaporation System
ei Series
This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.
Features
- Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
- Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
- Supports various substrates; substrates size from f2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
- Display and operation on LCD touch panel.
- Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).
Applications
- Compound-related devices of Power devices
- LED, LD and high-speed devices
- Various R&Ds
- Other general electronic devices