Batch-type High Vacuum Evaporation System ei-Series
This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.
Our Products and Technologies
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Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
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Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
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Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
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Display and operation on LCD touch panel.
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Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).
Special Features / Further Applications
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Compound-related devices of Power devices.
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LED, LD and high-speed devices.
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Various R&D Applications.
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Other general electronic devices.