Dry Etching Tool APIOS NE-950EX
Our LED Mass Productive System NE-950EX is equipped with 2 of our patented inventions and offers beside a outstanding output capacity, high maintainability, stability, reliability by its innovative design.
Our Products and Technologies
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Higher Through-Put(140% compared to a conventional systems)
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3 wafers batch processing availability in 6inch dia.
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7 wafers batch processing availability in 4inch dia.
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12 wafers batch processing availability in 3 inch dia.
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29 wafers batch processing availability in 2 inch dia.
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ICP with magnetic field ISM *1), high density plasma source which has over 600 delivery record in compound semiconductor market
*1:ULVAC Patent No.3188353
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Propriately Star electrode*2) which has self-cleaning function for deposited material from RF window
*2:ULVAC Patent No.3429391
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High maintainability, stability, reliability are achieved through re-deposition preventative design
Special Features / Further Applications
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Dry etching technology availability for various process applications (GaN, Sapphire, Metal, ITO, SiC, AlN, ZnO, 4 elements compound semiconductor materials, etc.)
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Various Options available