Load-Lock-type High Vacuum Evaporation System CV-Series
CV-200 consists of two chambers; a load-lock chamber and an evaporation chamber. Employing the load-lock type system enables the process to be carried out in a constantly clean environment. It also provides superior film repeatability. Application ranges from R&D use to small production.
Our Products and Technologies
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Load-lock type system to support high vacuum processes.
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Supports various substrate sizes.
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Supports substrate holder transfer.
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Supports lift-off deposition (standard; φ4 inch, option; up to φ6).
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Supports various evaporation sources (i.e. EB,RH, etc.).
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Supports high temperature heating (maximum of 450ºC).
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Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, P-CVD: CC-200, Polymerizing evaporation: CP-200).
Special Features / Further Applications
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Power devices.
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Compound-related devices of LED, LD and high speed devices.
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Organic EL material system for R&D use.
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Oxide evaporation of liquid crystal alignment layers.