High-temp Ion Implanter for SiC IH-860DSIC
The Ion Implanter IH-860DSIC is a system especially designed for mass production with high temp ESC for SiC.
Our Products and Technologies
- dual stage high throughput implanter for up to 150mm substrates
- dual stage for bridge tool capability (100/150mm) or both high temp. process & RT process are available
- up to 500C with hot plate type ESC and pre-heat stage
- rapid heating and good temperature uniformity
- 400keV single / 800keV double / 1.2MeV for triple Charge
- Footprint 8m x 3m
Special Features / Further Applications
-
SiC devices