High-temp Ion Implanter for SiC IH-860DSIC

The Ion Implanter IH-860DSIC is a system especially designed for mass production with high temp ESC for SiC.

Our Products and Technologies


  • dual stage high throughput implanter for up to 150mm substrates
  • dual stage for bridge tool capability (100/150mm) or both high temp. process & RT process are available
  • up to 500C with hot plate type ESC and pre-heat stage
  • rapid heating and good temperature uniformity
  • 400keV single / 800keV double / 1.2MeV for triple Charge
  • Footprint 8m x 3m

Special Features / Further Applications


  • SiC devices


Any questions?
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