Load-lock-type Plasma CVD System CC-200/400
The CC-Serie (CC-200/400) is a compact and easy-to-use system for R&D use and production.
Our Products and Technologies
- High-density plasma process on 27.12MHz
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Supports the deposition of SiH4 (SiO2, SiNx, SiON, a-Si ) and TEOS (SiO2)
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Supports the chamber cleaning by CF4+O2 plasma
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Supports the heater for low-temperature deposition of organic EL
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Supports various substrate sizes
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Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, Evaporation: CV-200)
Special Features / Further Applications
- compact and easy-to-use system for R&D
Further Applications
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Compound-related devices of LED, LD and highspeed devices
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Organic EL system for R&D use
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Solar battery system for R&D use
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MEMS