Load-lock-type Plasma CVD System CC-200/400

The CC-Serie (CC-200/400) is a compact and easy-to-use system for R&D use and production.

Our Products and Technologies

 

  • High-density plasma process on 27.12MHz
  • Supports the deposition of SiH4 (SiO2, SiNx, SiON, a-Si ) and TEOS (SiO2)

  • Supports the chamber cleaning by CF4+O2 plasma

  • Supports the heater for low-temperature deposition of organic EL

  • Supports various substrate sizes

  • Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, Evaporation: CV-200)

 

Special Features / Further Applications

 

  • compact and easy-to-use system for R&D

 

 

Further Applications

  • Compound-related devices of LED, LD and highspeed devices

  • Organic EL system for R&D use

  • Solar battery system for R&D use

  • MEMS

 

 

 

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