Products

Magnetic Multi-Layer System Magest S200

1. Triple-gun cathode
2. Outstanding controllability

Load-lock-type Sputtering System SDH-4550L

1. Compact footprint
2. Capability to deposit cosmetic films over EMI shield
3. Low temperature process

Load-lock-type Sputtering System CS-200

1. Footprint 0.9 x 2.3m
2. designed for small production
3. annealing at 2000°C for sputtered carbon

Back Side Metallization Sputtering System SRH-530

1. ESC method available
2. sizes 125 to 200mm
3. up to 5 process recipes

Cluster-type Sputtering System SME-200

1. Easy maintenance
2. Outstanding film stress control and particle reduction
3. High-quality deposition