Magnetic Multi-Layer System Magest S200

MagestTMS200 provides the multi-layer deposition of ultra thin films under the ultra high vacuum condition and is applicable for the deposition of various materials by RF or DC sputtering.



  • UHV (ultra-high vacuum) processes.

  • Triple-gun cathode.

  • Outstanding controllability and reproducibility with ultra-thin films of 10 nm or less

  • Excellent control of magnetic anisotropy and coercive force


Special Features / Further Applications


  • MRAM and Magnetic Device

  • Materials development


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